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Semiconductor and Electronics

Close-up of semiconductor wafer under precision testing equipment, representing high-purity sealing solutions for various environment and wafer fabrication processes.

At Katon®, we understand that the electronics, electrical, and semiconductor industries require the highest standards of reliability and precision. Our sealing solutions are engineered to withstand extreme conditions and provide dependable performance, ensuring your equipment operates smoothly. Whether it's for electrical applications,  semiconductor manufacturing equipment or post manufacturing pipelines, we’ve designed our products to meet the demanding needs of these critical industries.


Deposition Process

Semiconductor deposition processes such as CVD (Chemical Vapor Deposition), LPCVD and PECVD, etc. expose elastomer seals to elevated temperatures, vacuum conditions, and chemically reactive gases. Maintaining process stability, tool uptime, and wafer yield requires sealing materials that can withstand both thermal and chemical stress while maintaining its integrity. The Katon® FFKM O-ring compounds in this catagory are specifically engineered for low particle generation deposition environments. Our products are optimized for long-term stability under deposition process conditions—delivering low outgassing, high thermal resistance, and minimal particle generation to ensure clean chamber operation and consistent thin-film performance.

Features and Benefits

  • Exceptional thermal resistance for use in high-temperature deposition chambers
  • Outstanding compatibility with deposition gases
  • Low metal content and high chemical resistance to ensure low outgassing and minimal particle shedding, maintaining process cleanliness
  • Available in standard and custom O-ring sizes and profiles to fit leading deposition platforms

Available Size list

Katon® grades with Deposition Process

Katon® Compound Base Polymer Color Shore A (±5) Operating Temperature Curing System
Katon® 7175C FFKM OFF-WHITE 78 -10℃~230℃/14℉~446℉ Peroxide
Katon® 8175C FFKM UMBER 77 -10℃~290℃/14℉~554℉ Peroxide
Katon® 9175C FFKM DARK AMBER 72 -10℃~317℃/14℉~602℉ Triazine

Applicable Environments

Recommended

  • CVD, PECVD, LPCVD and ALD systems used in advanced semiconductor fabrication
  • Vacuum chambers exposed to high temperatures and chemically reactive precursors
  • Deposition tools requiring minimal particle generation seals with excellent stability
  • Static sealing points in gas delivery lines, chamber flanges, and lid seals

Not Recommended

  • General industrial applications not requiring high-purity sealing performance
  • Applications requiring resistance to specific halogenated fluids without specialized grades.
  • Uranium Hexafluoride (UF₆) Exposure

Our Services

Plasma Degradation Benchmarking
Due to the lack of a universal industry standard for characterizing elastomer resistance to plasma environments, OEMs and semiconductor fabs typically rely on in-site performance data and real-world testing. 

At Katon, we are committed to providing more than just high-quality O-Rings. We offer a complete customer experience from start to finish. Our services include:

  • Expert Consultation: Our team of engineers and product specialists work closely with you to understand your specific needs and provide tailored solutions.
  • Custom Solutions: We offer flexible options for custom sizes, materials, and configurations, ensuring a perfect fit for your unique applications.
  • Fast Turnaround: With our advanced manufacturing capabilities, we ensure quick production and delivery times to meet your project deadlines.
  • Technical Support: Our dedicated support team is always ready to assist with material selection, application advice, and troubleshooting.
  • Global Reach: Katon® serves industries worldwide, with a commitment to delivering reliable, cost-effective sealing solutions to customers across different sectors.

Whether you’re looking for standard O-Rings or specialized custom seals, Katon® is here to help you find the right solution, every time.